Ceramic Wafer Chuck

Arc will design a wafer chuck to a customer s unique requirements and quote the finished product.

Ceramic wafer chuck.

The wafer chuck ensures accurate positioning of the wafer in various process steps. Shown on the right is a 6 inch diameter free standing porous ceramic chuck plate with pores size 20um 10. Pared with ceramic the electrostatic force is 1 10 smaller and. By using ceramic materials flatnesses of less than 1 micron can be achieved.

Photomachining offers a variety of porous vacuum chuck designs for use with thin films semiconductor wafers and other flat samples. With our unique know how of ceramic industry and years immersing in semi conductor industry werlchem llc is at the forefront in the development of materials and components for the demanding environments of semiconductor processing such as chuck table wafer carriers cmp grinding and polishing chucks end effectors etc. The chuck plate plays an integral part in supporting the wafer throughout processing not just to accurately position the wafer during testing. Porous ceramic vacuum chuck.

Semixicon is based in the silicon valley serving world wide semiconductor photonics and medical etc industries with precision ceramic machining and assembly solutions with our core technology of wafer handling chuck tables. Arc also manufactures custom chucks from a customer s drawing or solid model. Heat transfer between the chuck and the wafer may be con sidered as the combination of contact point conduction heat. With applications for the semiconductor industry ever diversifying so are the substrate and materials used to provide new products.

When the wafer is held on the chuck it elastically deforms to the chuck s conic shape thus ensuring that the grinding wheel only contacts half of the wafer at any given instant. Advanced ceramic vacuum wafer chucks materials developed specifically for wafer handling as a leader in technical ceramics for wafer processing equipment coorstek understands advanced semiconductor manufacturing and constantly develops new materials designs and processes to optimize yields and extend product life. The chuck has a pore size of less than 25 microns 60 microns optional assuring uniform suction and strong holding power for even the smallest parts. Our wafer chuck tables electrostatic chucks and heaters are virtually found in many semiconductor equipment in most of.